Mask Aligner

The system enables high resolution exposure, because the system has an auto-alignment function for both top and back surface of wafer, and has three modes in exposure process, proximity, hard contact and soft contact mode.

Mask Aligner

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Mask Aligner

  • High accuracy alignment for both top an back surface by a high resolution objective lens
  • High accuracy paralleling mechanism (Wafer to Mask)
  • Precise pressure control for the mask contact
  • Auto wafer transportation and auto alignment
  • Precise gap control by laser beam sensor
Model